EUV SOURCE AT HiLASE: THE STATE OF THE ART

Abstract

An overview of the Extreme Ultraviolet (EUV) source to be constructed in the frame of the Czech national R&D project HiLASE (High average power pulsed LASErs) is presented. The HiLASE EUV source will be devoted to industrial and medical applications, as well as to fundamental studies (such as the chemistry of polymers). This wide variety of different applications depends on the possibility of targeting different EUV wavelengths (namely 13.5 nm and the water window range, 2.33-4.40 nm), which is insured by the fact that the projected table top EUV source can work on multiple different HiLASE lasers: the cryogenically cooled, Yb:YAG slab high energy laser system and the thin-disk, high repetition rate picosecond laser systems. HiLASE EUV source is intended as a user oriented device based on a laser plasma source with single stream gas-puff target.

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