INTENSITY DISTRIBUTION MODULATION OF MULTIPLE BEAM INTERFERENCE PATTERN

Abstract

Nanostructuring and microstructuring approaches frequently used in microelectronics manufacturing, such as electron beam lithography or nanoimprint lithography, are considerably slow. In order to reduce processing time, laser patterning methods based on interference of multiple beams have been developed. Within one laser pulse, a significant part of an irradiated area on a sample surface is patterned with desired micro- or sub-microstructures. Nowadays, interference patterning goes beyond periodic lines and dots. Controlling the number of interfering beams, orientation of polarization vectors, relative phase shift, and the beam angle of incidence allows to customize the intensity distribution on the sample surface. Simulations of various interference patterns were calculated and verified on CMOS camera using 1030 nm laser diode. Based on these results, dot and line-like interference patterns were directly imprinted on the surface of carbon fiber reinforced polyether ether ketone plate by 1.8 ps, 11 mJ laser pulses at 1030 nm.

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