NUMERICAL SIMULATIONS OF TEMPERATURE DYNAMICS DURING CW LASER IRRADIATION OF SILICON MICROSCALE STRIPS ON A DIELECTRIC SUBSTRATE

Abstract

The numerical model presented in this article describes the heating of a thin strip of amorphous silicon on glass substrate by a continuous-wave Ar+ laser. The heat flow equation is solved using a finite difference method based on the implicit scheme with splitting by coordinates. A short overview of the methods of numerical analysis is given and the finite difference method is described in details including the numerical scheme, the algorithms with discussion of their validity, the quality of approximation and stability. The results of the simulations with a high spatio-temporal resolution help to determine the exposure time necessary to melt the entire cross-section of silicon strip and to get insight into the final temperature distribution in silicon as well as in the glass substrate.

Recommended articles

OPTIMIZATION OF FIVE-AXIS FINISH MILLING USING A VIRTUAL MACHINE TOOL

Petr Kolar, Matej Sulitka, Vojtech Matyska, Petr Fojtu
Keywords: surface quality | machining productivity | control system | interpolator | milling accuracy | virtual machine tool | finishing milling | Five-axis machining

OPTO-MECHANICAL SYSTEM FOR LASER BEAM DISTRIBUTION

Karolina Macuchova, Jan Hermanek, Martina Rehakova
Keywords: HiLASE | vacuum chamber | opto-mechanical design | high-power laser | laser beam distribution | Laser facility

THERMOELASTIC RESPONSE OF METALS AT DIFFERENT LOADING RATES

Radek Prochazka, Sylwia Rzepa, Pavel Konopik
Keywords: loading rate effect | thermoelastic stress analysis (TSA) | thermoelasticity

IMPLEMENTATION OF THE DESIGNED PROGRAM FOR CALCULATION AND CHECK OF CHAIN GEARS

Jozef Mascenik
Keywords: strength | design | calculation | chain gears | program